Specialty cleaning products for wafer and micro-chip CMP.
UV curable resins and coatings for specific end use applications.
Alternative sources of raw materials to supply your business.
Our innovative Briteclean chemical products are specially designed for the Chemical-Mechanical-Planarization (CMP) process used for wafers and integrated circuits (IC). Briteclean provides easier and more efficient control of your process. Briteclean materials can be used throughout your entire CMP process, including as an add-mix to slurries for enhanced effectiveness and cleaning uniformity.
Cleaning solution for CMP on Dielectrie, Metal and Organic Polymer Surfaces for PSD, MOx, SiO2 Al2O3
Chemical Formula | Proprietary |
Content | Surfactants, anti-coagulation agents, metal cleaning agents, and water |
pH | 4.50±5.10 |
Packaging: | 5 gallons, 15 gallons, and 55 gallons |
Cleaning solution for CMP on Dielectrie, Metal and Organic Polymer Surfaces for PSD, MOx, SiO2 Al2O3
Chemical Formula | Proprietary |
Content | Surfactants, anti-coagulation agents, metal cleaning agents, and water |
pH | 4.85±0.30 |
Packaging: | 5 gallons, 15 gallons, and 55 gallons |
Cleaning solution for CMP
Chemical Formula | Proprietary |
Content | Hydrophobic/hydrophilic balanced surfactants, anti-oxidant agents, anti-corrosive agents, water |
Appearance | Light yellow transparent liquid with garlic-like odor |
Viscosity | 250-350 cps at 25C |
pH | 8.40±0.30 |
Packaging: | 5 gallons, 15 gallons, and 55 gallons |
In process cleaning/storage media for CMP
Chemical Formula | Proprietary |
Content | Surfactants, anti-oxidant agents, anti-corrosive agents & dispersion agents |
Appearance | Dark yellow/amber liquid with garlic-like odor |
Viscosity | 250-350 cps |
pH | 7.00±0.30 |
Packaging: | 1 gallons, 5 gallons |
Cleaner for CMP
Chemical Formula | Proprietary |
Content | Hydrophobic/hydrophilic balanced surfactants, anti-oxidant agents, anti-corrosive agents, water |
Appearance | Light yellow transparent liquid |
pH | 10.80±0.30 |
Packaging: | 5 gallons, 15 gallons or 55 gallons |
Cleaner for CMP on 3D wafer for Ce slurries. The Maxima and best Cleaning efficiency targeting Ce is to mix with hydrogen peroxide ( H2O2) .
Chemical Formula | Proprietary |
Content | Hydrophobic/hydrophilic balanced surfactants and metal Ce3+/Ce2+ chelating agents and water |
Appearance | Clear transparent liquid |
pH | 5.10±0.30 |
Packaging: | 5 gallons, 15 gallons or 55 gallons |
Cleaner for CMP
Chemical Formula | Proprietary |
Content | Synthetic phyllosilicate |
Appearance | Off White |
pH | 9.00±10.00 |
Packaging: | 5 gallons, 15 gallons or 55 gallons |
CMP, Chemical Mechanical Planarization is a very important process, which controls your sigma quality and yield. Briteclean is our family of products used for CMP process. The family includes Briteclean-0+, Briteclean-1, Briteclean-Ultra and Briteclean-ACP. Each of these products has its own function in CMP.
The Briteclean family is unique in the marketplace because of their balance of hydrophobicity & hydrophilicity, with specially designed chemistry. Our Briteclean products can be used in many stages of CMP, including as slurry additive, post cleaning, and wafer storage. The Briteclean products are versatile. They can be used on almost any substrate and with most slurries including alumina and silicate.
Brizon has lab location in Taiwan using new and updated Polishing technology to test our BriteClean series.